Ing. Jozef MARTAUS, PhD.

2010

Cambel, V., Eliáš, P., Gregušová, D., Martaus, J., Fedor, J., Karapetrov, G., and Novosad, V.: Magnetic elements for switching magnetization magnetic force microscopy tips, J. Magnetism Magn. Mater. 322 (2010) 2715-2721.

Cambel, V., Eliáš, P., Gregušová, D., Fedor, J., Martaus, J., Karapetrov, G., Novosad, V., and Kostič, I.: Novel magnetic tips developed for the switching magnetization magnetic force microscopy, J. Nanosci Nanotechnol. 10 (2010) 4477-4481.

Martaus, J., Cambel, V., Gregušová, D., Kúdela, R., and Fedor, J.: 50-nm local anodic oxidation technology of semiconductor heterostructures, J. Nanosci Nanotechnol. 10(2010) 4448-4453.

2009

Gregušová, D., Martaus, J., Fedor, J., Kúdela, R., Kostič, I., and Cambel, V.: On-tip sub-micrometer Hall probes for magnetic microscopy prepared by AFM lithography, Ultramicroscopy 109 (2009) 1080-1084.

2008

Cambel, V., Martaus, J., Šoltýs, J., Kúdela, R., and Gregušová, D.: Local anodic oxidation by AFM tip developed for novel semiconductor nanodevices, Ultramicroscopy 108 (2008)1021-1024.

Martaus, J., Gregušová, D., Cambel, V., Kúdela, R., and Šoltýs, J.: New approach to local anodic oxidation of semiconductor heterostructures, Ultramicroscopy 108 (2008) 1086-1089.

Martaus, J., Cambel, V., Gregušová, D., and Kúdela, R.: Sub-micron Hall probes prepared by tip-induced local anodic oxidation. In: ASDAM 2008. The 7^th Inter. Conf. Advanced Semicond. Devices Microsyst. Eds. Š. Haščík and J.Osvald. Piscataway: IEEE 2008. ISBN: 978-1-4244-2325-5. P. 195-198.

2007

Cambel, V., Martaus, J., Šoltýs, J., Kúdela, R., and Gregušová, D.: AFM nanooxidation process – technology perspective for mesoscopic structures, Surface Sci. 601(2007) 2717-2723.

Gregušová, D., Kučera, M., Hasenöhrl, S., Vávra, I., Štrichovanec, P., Martaus, J., and Novák, J.: Impact of growth conditions on the spatial non-uniformities of composition in InGaP epitaxial layers, Physica Status Solidi c 4 (2007) 1419-1422.

Martaus, J., Gregušová, D., Cambel, V., Kúdela, R., and Šoltýs, J.: AFM tip induced local anodic oxidation of InGaP/AlGaAs/GaAs heterostructures. In: 12^th European Workshop on Metalorganic Vapour Phase Epitaxy – EW-MOVPE XII: extended abstracts. Bratislava: IEE SAS, 2007. P. 299-302.

Kúdela, R., Martaus, J., Cambel, V., Kučera, M., and Dobročka, E.: Novel MOVPE grown 2DEG structures for local anodic oxidation. In: 12^th European Workshop on Metalorganic Vapour Phase Epitaxy – EW-MOVPE XII: extended abstracts. Bratislava: IEE SAS, 2007. P. 49-52.

2006

Eliáš, P., Haščík, Š., Martaus, J., Kostič, I., Šoltýs, J., and Hotový, I.: CCl₄-based RIE pattern transfer into facets of mesas formed by wet etching in InP(100), Electrochem. Solid-State Lett. 9 (2006) G27-G30.

Eliáš, P., Gregušová, D., Martaus, J., and Kostič, I.: Conformal AZ5214-E resist deposition on patterned (1 0 0) InP substrates, J. Micromech. Microengn. 16 (2006) 191–197.

Cambel, V., Šoltýs, J., Martaus, J., and Moško, M.: IV characteristics in structures prepared by tip induced oxidation, J. de Physique IV 132 (2006) 171-175.

Haščík, Š., Eliáš, P., Šoltýs, J., Martaus, J., and Hotový, I.: CCl₄-based reactive ion etching of semi-insulating GaAs and InP, Czechoslov. J. Phys. B 56 (2006) S1169-S1173.

Martaus, J., Cambel, V., Kúdela, R., Gregušová, D., and Šoltýs, J.: 2D electron transport through potential barrier prepared by LAO on shallow GaAs/Al_xGa_1-xAs/InGaP heterostructures. In: ASDAM 2006. Proc. 6^th Int. Conf. on Advanced Semiconductor Devices and Microsystems. Eds. J. Breza et al. Piscataway: IEEE 2006. ISBN: 1-4244-0396-0. P. 253-256.

2005

Eliáš, P., Martaus, J., Šoltýs, J., and Kostič, I.: Micromachining of mesa and pyramidal-shaped objects in (1 0 0) InP substrates, J. Micromech. Microengn. 15 (2005) 1007-1014.