Ing. Michal JURKOVIČ

2012

Čičo, K., Gregušová, D., Kuzmík, J., Jurkovič, M., Alexewicz, A., di Forte Poisson, M.-A., Pogany, D., Strasser, G., Delage, S., and Fröhlich, K.: Influence of processing and annealing steps on electrical properties of InAlN/GaN high electron mobility transistor with Al₂O₃ gate insulation and passivation, Solid-State Electr. 67 (2012) 74-78.

2010

Jurkovič, M., Hušeková, K., Čičo, K., Dobročka, E., Nemec, M., Fedor, J., and Fröhlich, K.: Characterization of high permittivity GdScO₃ films prepared by liquid injection MOCVD. In: ASDAM ’10. Smolenice 2010. Ed. J. Breza et al. Piscataway: IEEE 2010. ISBN: 978-1-4244-8572-7. P. 247-250.