Ing. Ivan KUNDRATA

  • 2024

Kern S., Yi, G., Büttner, P., Scheler, F., Tran, M.-H., Korenko, S., Dehm, K.E., Kundrata, I., Zahl, A., Albrecht, S., Bachmann, J., and Crisp, R.W.: Monolithic two-terminal tandem solar cells using Sb2S3 and solution-processed pbs quantum dots achieving an open-circuit potential beyond 1.1 V, ACS Applied Mater. Interfaces 16 (2024) 13903-13913. (Not IEE SAS)

  • 2023

Stefanovic, S., Gheshlaghi, N., Zanders, D., Kundrata, I., Zhao, B., Barr, M.K.S., Halik, M., Devi, A., and Bachmann J.: Direct-patterning ZnO deposition by atomic-layer additive manufacturing using a safe and economical precursor, Small, 19 (2023) 2301774. (Not IEE SAS)

Varga, A.C., Carnoy, M., Kundrata, I., Plakhotnyuk, M., and Bachmann, J.: Multi cycle and material deposition for spatial atomic layer deposition process, IEEE Nanotechnol. Mater. Devices Conf., NMDC 2023, pp. 248-249. (Not IEE SAS)

  • 2022

Kundrata, I., Barr, M.K.S., Tymek, S., Döhler, D., Hudec, B., Brüner, P., Vanko, G., Precner, M., Yokosawa, T., Spiecker, E., Plakhotnyuk, M., Fröhlich, K., and Bachmann, J.: Additive manufacturing in atomic layer processing mode, Small Methods (2022) 2101546.

Koch, V.M., Charvot, J., Cao, Y., Hartmann, C., Wilks, R.G., Kundrata, I., Mínguez-Bacho, I., Gheshlaghi, N., Hoga, F., Stubhan, T., Alex, W., Pokorný, D., Topraksal, E., Smith, A.-S., Brabec, C.J., Bär, M., Guldi, D.M., Barr, M.K.S., Bureš, F., and Bachmann, J.: Sb2Se3 thin-film growth by solution atomic layer deposition, Chem. Mater. 34 (2022) 9392–9401. (Not IEE SAS)

  • 2021

Kundrata, I., Mošková, A., Moško, M., Mičušík, M., Dobročka, E., and Fröhlich, K.: Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory, J. Vacuum Sci Technol. A 39 (2021) 062407.

  • 2020

Hutár, P., Sojková, M., Kundrata, I., Vegso, K., Shaji, A., Nádaždy, P., Pribusová Slušná, L., Majková, E., Siffalovic, P., and Hulman, M.: Correlation between the crystalline phase of molybdenum oxide and horizontal alignment in thin MoS2 films, J. Phys. Chem. C 124 (2020) 19362–19367.

  • 2019

Kundrata, I., Fröhlich, K., Vančo, L., Mičušík, M., and Bachmann, J.: Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films, Beilstein J. Nanotechnol. 10 (2019) 1443-1451.

Chymo, F., Fröhlich, K., Kundrata, I., Hušeková, K., Harmatha, L., Racko, J., Breza, J., and Mikolášek, M.: Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting, AIP Conf. Proc. 2131 (2019) 020020.

  • 2018

Fröhlich, K., Kundrata, I., Blaho, M., Precner, M.,Ťapajna, M.,Klimo, M., Šuch, O., and Škvarek, O.: Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions, J. Applied Phys. 124 (2018) 152109.

2017

Kukli, K., Kemeli, M., Vehkamäki, M., Heikkilä, M.J., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M., Kundrata, I., and  Fröhlich, K.: Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films, AIP Adv. 7 (2017) 025001.