1. Massa, E.: J. Applied Crystall. 53 (2020) 1195. 2. Klimova, N.: Crystals 11 (2021) 504.
Zápražný, Z., Korytár, D., Jergel, M., Halahovets, Y., Maťko, I., Šiffalovič, P., Kečkéš, J., Mikulík, P., Majková, E., and Thi, T.N.T.: Study of surface quality and subsurface damage of germanium optics produced by single point diamond nanomachining, Proc. SPIE DL 11032 (2019) 11032E.1. Tan, J.W.: Laser Photon. Rev. 17 (2023) Iss. 8.
Zápražný, Z., Korytár, D., Jergel, M., Halahovets, Y., Kotlár, M., Maťko, I., Hagara, J., Šiffalovič, P., Keckes, J., and Majková, E.: Characterization of the chips generated by the nanomachining of germanium for X-ray crystal optics, Inter. J. Adv. Manufactur. Technol. 102 (2019) 2757-2767.1. Shahinian, H.: Proc. SPIE 11175 (2019) UNSP 111750E. 2. Zhu, H.: J. Manufact. Process. 69 (2021) 351.
Zaťko, B., Hrubčín, L., Šagátová, A., Osvald, J., Boháček, P., Zápražný, Z., Sedlačková, K., Sekáčová, M., Dubecký, F., Skuratov, V.A., Korytár, D., and Nečas, V.: Schottky barrier detectors based on high quality 4H-SIC semiconductor: electrical and detection properties, Applied Surface Sci 461 (2018) 276-280.1. Zhou, Y.: Carbon 148 (2019) 387. 2. Dong, P.: IEEE Access 7 (2019) 170385. 3. Sarac, Y.: J. Alloys Comp. 824 (2020) 153899. 4. Xie, X.-M.: Trans. Nonferr. Metals Soc China 30 (2020) 3058. 5. Jiang, L.: Nuclear Instr. Methods in Phys. Res. A 1048 (2023) 167917. 6. Chen, L.: Ceramics Inter. 50 (2024) 30560.
Korytár, D., Zápražný, Z., Ferrari, C., Frigeri, C., Jergel, M., Maťko, I., and Kečkeš, M.: Cross-sectional TEM study of subsurface damage in SPDT machining of germanium optics, Applied Optics 57 (2018) 1940-1943.# 1. Zhao, L.-D.: Guangzi Xuebao/Acta Photonica Sinica 47 (2018) 0822002. 2. Zhao, Q.: Proc. Inst. Mechan. Eng. Part B-J. Engn. Manufact. 233 (2019) 2251. 3. Xu, J.: Proc. SPIE 11175 (2019) UNSP 1117508. # 4. Shahinian, H.: Proc. 34th ASPE Ann. Meeting 2019, pp. 319-324. 5. Maksakova, O.V.: J. Alloys Compounds 831 (2020) 154808. # 6. Geng, R.: Xiyou Jinshu/Chinese J. Rare Metals 44 (2020) 850. 7. Geng, R.W.: Infrared Phys. Technol. 116 (2021) 103773. 8. Fang, F.Z.: Inter. J. Machine Tools Manufact. 178 (2022) 103905. 9. Xu, J.: Applied Optics 62 (2023) 4161. # 10. Xu, J.: Proc. SPIE 12778 (2023) 1277812. # 11. Xu, J.: Proc. Optica Design and Fabrication Congress 2023, IODC, OFT Part of Optica Design and Fabrication Congress 2023. 12. Shi, F.Y.: Precision Engn.-J. Inter. Soc Precision Engn. Nanotechnol. 86 (2024) 75.
Zaťko, B., Zápražný, Z., Jakůbek, J., Šagátová, A., Boháček, P., Sekáčová, M., Korytár, D., Nečas, V., Žemlička, J., Mora, Y., and Pichotka, M.: Imaging performance of Timepix d etector based on semi-insulating GaAs, J. Instrument. 13 (2018) C01034.1. Veale, M. C.: J. Phys. D 52 (2019) 085106. 2. Curtis, T.E.: J. Medical Imaging 6 (2019) 013501.
Šiffalovič, P., Végsö, K., Hodas, M., Jergel, Ma., Halahovets, Y., Pelletta, M., Korytár, D., Zápražný, Z., and Majková, E.: In situ x-ray reciprocal space mapping for characterization of nanomaterials. In: X-ray and neutron techniques for nanomaterials characterization. Ed. C. S.S.R. Kumar. Berlin, Springer 2016. ISBN 978-3-662-48604-7. P. 507-544.1. Nsabimana, A.: Nanopart. Design Character. Catalyt. Appl. Sustain. Chem. 38 (2019) 163. # 2. Barannikov, A.: Proc. SPIE 11776 (2021) 117760D.
Végsö, K., Jergel, M., Šiffalovič, P., Majková, E., Korytár, D., Zápražný, Z., Mikulík, P., and Vagovič, P.: Towards high-flux X-ray beam compressing channel-cut monochromators, J. Applied Crystall. 49 (2016) 1885-1892.1. Shioya, N.: Applied Phys. Express 13 (2020) 095505. 2. Jiang, Z.: J. Korean Phys. Soc 79 (2021) 697.
Zápražný, Z., Korytár, D., Jergel, M., Šiffalovič, P., Halahovets, Y., Keckes, J., Matko, I., Ferrari, C., Vagovič, P., and Mikloška, M.: Nano-machining for advanced x-ray crystal optics, AIP Conf. Proc. 1764 (2016) 020005. # 1. Goel, B.: Inter. J. Machin. Machinab. Mater. 23 (2021) 160-190. Hrivňak, S., Uličný, J., Mikeš, L., Cecilia, A., Hamann, E., Baumbach, T., Švéda, L., Zápražný, Z., Korytár, D., Gimenez, E., Wagner, U., Rau, C., Greven, H., Vagovič, P., : Single-distance phase retrieval algorithm for Bragg Magnifier microscope. Optics Express 24 (2016) 27753-27762.1. Ryu, D.: Biomedical Optics Express 8 (2017) 1981. 2. Lu, H.: Laser Optoelectr. Progress 57 (2020) 140001.
1. Nalimov, A.G.: Computer Optics 42 (2018) 933. 2. Wen, H.: Sci Rep. 8 (2018) 10978. 3. Hirano, K.: J. Synchrotron Radiat. 29 (2022) 787.
Zápražný, Z., Korytár, D., Šiffalovič, P., Jergel, Ma., Demydenko, M., Mikulík, P., Dobročka, E., Ferrari, C., Vagovič, P., and Mikloška, M.: Simulations and surface quality testing of high asymetry angle x-ray crystal monochromators for advanced x-ray imaging applications, Proc. SPIE 9207 (2014) 92070Y.1. Zhu J.: Acta Phys. Sinica 67 (2018) 036102.
Wachulak, P., Wegrzynski, L., Zápražný, Z., Bartnik, A., Fok, T., Jarocki, R., Kostecki, J., Szczurek, M.,Korytár, D., Fiedorowicz, H., : Extreme ultraviolet tomography of multi-jet gas puff target for high-order harmonic generation. Applied Phys. B 117 (2014) 253-263.1. Stafe, M.: Univ. Politehn. Bucharest Sci Bull.-Ser. A77 (2015) 187. 2. Kantsyrev, V.L.: High Energy Density Phys.19 (2016) 11. 3. Schultz, K. A.: Phys. Plasmas 23 (2016) 101207. 4. Tchulov, O.: Sci. Rep. 7 (2017) 6814. 5. Comby, A.: Optic Express 26 (2018) 6001. 6. Schultz, K. A.: Laser Particle Beams 37 (2019) 276. 7. Hagmeister, B.: Applied Phys. B 128 (2022) 172.
# 1. Pérez Prada, M.: Instruments 6 (2022) 66. 2. Sirkeli, V.P.: Phys. Solid State 66 (2024) 257.
Vagovič, P., Švéda, L., Cecilia, A., Hammann, E., Pelliccia, D., Gimenez, E., Korytár, D., Pavlov, K., Zápražný, Z., Zuber, M., Koenig, T., Olbinado, M., Yashiro, W., Momose, A., Fiederle, M., and Baumbach, T.: X-ray Bragg magnifier microscope as a linear shift invariant imaging system: image formation and phase retrieval, Optics Express 22 (2014) 21508-21520.1. Hirano, K J. Synchrotron Radiation 22 (2015) 956. # 2. Rau, C.: Synchrotron Radiation News 30 (2017) 19. 3. Lu, H.: Laser Optoelectr. Progress 57 (2020) 140001.
1. Zheng, N.: J. Applied Crystall. 48 (2015) 608. 2. Fewster, P.F.: X-Ray Scattering from Semiconductors and other Materials. World Sci 2015. ISBN-13: 978-9814436922. P. 243.
1. Camattari, R.: J. Applied Crystall. 47 (2014) 1762. 2. Paterno, G.: J. Applied Crystall. 48 (2015) 125. 3. Mazzolari, A.: Nuclear Instrum. Methods in Phys. Res. B 355 (2015) 297. 4. Camattari, R.: J. Applied Crystall. 48 (2015) 943. 5. Camattari, R.: J. Applied Crystall. 48 (2015) 977. 6. Bellucci, V.: Applied Phys. Lett. 107 (2015) 064102. 7. Paterno, G.: J. Applied Crystall. 49 (2016) 468. 8. Camattari, R.: Astronomy & Astrophys. 587 (2016) A21. 9. Camattari, R.: J. Applied Crystall. 50 (2017) 145. # 10. Kurhekar, A.S.: Proc. ICECS 2017, 8067870, p. 206. 11. Camattari, R.: Experiment. Astron. 46 (2018) 309. 12. Mazzolari, A.: Phys. Rev. Res. 3 (2021) 013108. 13. Girou, D.: Phys. Medicine Biol. 66 (2021) 245007. 14. Lider, V.V.: Optics Spectroscopy 131 (2023) SI1016.
* 1. Kim, S.J.: Progress Medical Phys. 24 (2013) 41. 2. Hirano, K.: Nuclear Instrum. Methods in Phys. Res. A 741 (2014) 78. 3. Hirano, K J. Synchrotron Radiation 22 (2015) 956. 4. Cusatis, C.: J. Applied Crystall. 48 (2015) 876. 5. Hirano, K.: AIP Conf. Proc. 1741 (2016) 040020. 6. Lu, H.: Laser Optoelectr. Progress 57 (2020) 140001. 7. Huang, P.: J. Synchrotron Radiation 28 (2021) 292.
1. Hirano, T.: Rev. Sci Instrum. 87 (2016) 063118.
1. Cusatis, C.: J. Applied Crystall. 48 (2015) 876.
1. Fatima, A.: J. Synchrotron Radiation 24 (2017) 232.
1. Sung, Y.: Optics Express 21 (2013) 17547. 2. Sung, Y.: Optics Express 21 (2013) 23671.
1. Frahm, R.: J. Synchrotron Radiat. 26 (2019) 1879. 2. Mizuhata, M.: J. Electrochem. Soc 168 (2021) 046516.
Vagovič, P., Korytár, D., Mikulík, P., Cecilia, A., Ferrari, C., Yang, Y., Hänschke, D., Hamann, E., Pelliccia, D., Lafford, T., Fiederle, M., Baumbach, T., : In-line Bragg magnifier based on V-shaped germanium crystals. J. Synchrotron Radiation 18 (2011) 753-760.* 1. http://www.americanelements.com/ge2i.html. 2. Hirano, K.: Nuclear Instrum. Methods in Phys. Res. A 741 (2014) 78. 3. Wu, Y.: Japan. J. Applied Phys. 54 (2015) 096701.
Korytár, D., Ferrari, C., Mikulík, P., Germini, F., Vagovič, P., and Baumbach, T.: High resolution 1D and 2D crystal optics based on asymmetric diffractors. In: Modern Developments in X-Ray and Neutron Optics. Ser.: Springer Ser. Optical Sci, Vol. 137. Eds. Erko, A. et al. Berlin: Springer 2008. ISBN: 978-3-540-74560-0. P. 501-512.1. Cocco, D.: Phys. Rep.-Rev. Sec. Phys. Lett. 974 (2022) 1.
Áč, V., Perichta, P., Korytár, D., and Mikulík, P.: Thermal effects under synchrotron radiation power absorption. In: Modern Developments in X-Ray and Neutron Optics. Series: Springer Series in Optical Sciences, Vol. 137. Eds. Erko, A. et al. Berlin: Springer 2008. ISBN: 978-3-540-74560-0. P. 513-524.1. Vartanian, V.: J. Micro-Nanolith. MEMS MOEMS 13 (2014) 011206. 2. Oreshko, A.P.: Moscow Univ. Phys. Bull. 75 (2020) 249.
1. Celik, A.: X-Ray Spectrometry 37 (2008) 490. * 2. Akimov, J.K.: Poluprovodnikovyje detektory jadernych izlučenij. Dubna: 2009. 277 s. ISBN 978-5-9530-0213-4. * 3. Avenel-Le Guerroue, M.L.: PhD Thesis. Grenoble: CEA – LETI – Direction de la Recherche Technologique 2012. 4. Manifacier, J.C.: Solid-State Electr. 80 (2013) 45. 5. Mouleeswaran, D.: J. Crystal Growth 362 (2013) 238. 6. D’Aillon, E.G.: Nuclear Instrum. Methods in Phys. Res. A 727 (2013) 126. 7. Kurucova, N.: J. Instrument. 19 (2024) C03049.
1. Yi, J.M.: J. Applied Crystallography 40 (2007) 376. 2. Calamiotou, M.: J. Applied Phys. 102 (2007) art. no. 083527. 3. Zeimer, U.: Physica Status Solidi A 204 (2007) 2753. 4. Zhong, Y.: J. Phys. D 40 (2007) 5301. 5. Honnicke, M.G.: J. Applied Crystall. 42 (2009) 999. 6. Honnicke, M.G.: J. Electronic Mater. 39 (2010) 727. * 7. Tasca, K. R.: PhD Thesis. Univ. Federal do Paraná, Curitiba 2010, Paraná. 8. Kluender, R.: Physica Status Solidi A 208 (2011) 2505. * 9. Kluender, R.: Thesis. Univ. Grenoble 2011. 10. Tsoutsouva, M.G.: J. Crystal Growth 401 (2014) 397. 11. Tsoutsouva, M.G.: J. Applied Crystall. 48 (2015) 645. 12. Tsoutsouva, M. G.: Acta Materialia 88 (2015) 112. 13. Thu, N.T.T.: Solar Energy Mater. Solar Cells 135 (2015) SI17. 14. Honnicke, M.G.: J. Applied Crystall. 49 (2016) 1443. 15. Stoupin, S.: AIP Conf. Proc. 1741 (2016) 050020. 16. Thu, N.T.T.: J. Applied Crystall. 50 (2017) 561. 17. Kim, J.: CRYSTENGCOMM 20 (2018) 7761. 18. Kim, J.: Applied Phys. Express 11 (2018) 081002. 19. Macrander, A.: J. Applied Crystall. 52 (2019) 115. 20. Kim, J.: CRYSTENGCOMM 21 (2019) 2281. 21. Kim, J.: Phys. Rev. Applied 11 (2019) 024072. 22. Suzuki, R.: J. Applied Crystall. 54 (2021) 163. 23. Yildirim, C.: J. Synchrotron Radiat. 28 (2021) 301. 24. Meduna, M.: J. Applied Crystall. 54 (2021) 1071. # 25. Sutter, J.P.: Proc. SPIE 1269 (2023) 12694. 26. Sakata, O.: Sci Technol. Adv. Mater. 3 (2023) 2199130.
* 1. Santin, R. Microscopia de raios x com cristais perfeitos assimétricos. Diploma Work.Curitiba: 2007.
1. Macrander, A.T.: Applied Phys. Lett. 87 (2005) 194113. 2. Calamiotou, M.: J. Applied Phys. 102 (2007) 083527. * 3. Zeimer, U.: 11th Inter. Conf. Defects: Recognition, Imaging Phys. in Semicond. Beijing (2007). 4. Barber, Z. H.: Materials Sci Technol. 24 (2008) 757. 5. An, Y.H.: Inter. J. Engn. Scie 47 (2009) 866. * 6. en.wikipedia.org/wiki/Diffraction_topography 7. Stoupin, S.: AIP Conf. Proc. 1741 (2016) 050020. 8. Kim, J.: Applied Phys. Express 11 (2018) 081002. 9. Macrander, A.: J. Applied Crystall. 52 (2019) 115. 10. Suzuki, R.: J. Applied Crystall. 54 (2021) 163. 11. Lider, V.V.: Phys. Solid State 63 (2021) 189. 12. Meduna, M.: J. Applied Crystall. 54 (2021) 1071. 13. Sakata, O.: Sci Technol. Adv. Mater. 3 (2023) 2199130.
* 1. Authier, A.: In: Dynamical theory of X-ray diffraction. Oxford: OUP 2004. P. 568. * 2. Santin, R. Microscopia de raios x com cristais perfeitos assimétricos. Diploma Work.Curitiba: 2007. 3. Szabo, C.I.: Rev. Sci Instrum. 81 (2010) 10E311. 4. Zverev, D.: Optics Express 29 (2021) 35038.
* 1. Lu, W.: Inter. J. Machining Machinab. Materials 2 (2007) 125. * 2. Zhang, J.: Nano and Micromachining. London: ISTE 2010. ISBN 978-0470611807. P. 157-174.
* 1. Pelfer, P.G: SIMC-XII-2002. Piscataway: IEEE 2002. P. 273. 2. Gorodynskyy, V.: Nuclear Instr. Methods A 555 (2005) 288. * 3. Perďochová, A.: PhD. Thesis. Bratislava: FEI STU 2005. 4. Zdansky, K.: IEEE Trans. Nuclear Sci 56 (2009) 2997.
* 1. Authier, A.: In: Dynamical theory of X-ray diffraction. Oxford: OUP 2004. P. 460. * 2. Ressel, R.: XTOP 2004. Poster No. P-103. 3. Lengyel, O.: Advanced Mater. 18 (2006) 896. 4. Oberta, P.: J. Synchrotron Radiation 18 (2011) 522. 5. Dolabella, S.: Small Methods 6 (2022) 2100932.
* 1. Hrdá, J.: PhD Thesis. Praha 2007. * 2. Oberta, P.: PhD Thesis. Olomouc 2008.
1. Hrdy, J.: J. Synchrotron Radiation 8 (2001) 1200. # 2. Hrdy, J.: Proc. SPIE 4501 (2001) 88. * 3. Artemiev, N.: Doctoral Thesis. Praha: Inst. Phys. CAS 2002. * 4. Hrdá, J.: PhD Thesis. Praha 2007.
# 1. Zhao, Y.: Chinese J. Semicond. 26 (2005) S52. 2. Kowalski, G.: Acta Physica Polonica A 114 (2008) 391.
1. Zdansky, K.: Semicond. Sci Technol. 16 (2001) 1002.
1. Hrdy, J.: J. Synchrotron Radiation 8 (2001) 1200. 2. Hrdy, J.: Proc. SPIE 4501 (2001) 88. * 3. Artemiev, N.: Doctoral Thesis. Praha: Inst. of Physics CAS 2002. * 4. Hrdá, J.: PhD Thesis. Praha 2007.
* 1. Avenel-Le Guerroue, M.L.: PhD Thesis. Grenoble: CEA – LETI – Direction de la Recherche Technologique 2012.
1. Kyutt, R.N.: Technical Phys. 56 (2011) 668. 2. Kyutt, R.N.: Technical Phys. Lett. 38 (2012) 38. 3. Kyutt, R. N.: Physica Status Solidi C 10 (2013) 476. 4. Kyutt, R. N.: J. Applied Crystall. 46 (2013) 861. 5. Kyutt, R.N.: Phys. Solid State 60 (2018) 695.
1. Moore, C.D.: Mater. Sci Engn. B 66 (1999) 11. 2. Lubbert, D.: Nuclear Instr. Methods B 160 (2000) 521. 3. Taylor, M.: Mater. Sci Engn. B 80 (2001) 95. 4. Mikulik, P.: Applied Surface Sci 253 (2006) 188. * 5. Mikulik, P.: Habilitation Thesis. Brno 2008. 6. Yang, G.L.: Diamond Related Mater. 19 (2010) 719. 7. Domagala, J.Z.: Radiation Phys. Chem. 93 (2013) 174. 8. Guo, J.: ECS Trans. 80 (2017) 245. 9. Guo, J.: J. Electron. Mater. 47 (2018) 903. 10. Kim, J.: CRYSTENGCOMM 21 (2019) 4036. 11. Kim, J.: Phys. Rev. Applied 11 (2019) 024072. 12. Liu, Y.F.: J. Crystal Growth 583 (2022) 126559. 13. Sakata, O.: Sci Technol. Adv. Mater. 3 (2023) 2199130.
1.Goorsky, M.S.: Lattice Mismatched Thin Films 1999. P. 73. 2. Lankinen, A.: Nuclear Instrum. Methods in Phys. Res. A 563 (2006) 62. * 3. Lomov, A.A.: Doktor. diz. práca. Moskva 2006. 369 s. 4. Zhou, X.-L.: Chinese Phys. Lett. 31 (2014) 128101.
1. Szabo, J.: Japan J. Applied Phys. 35 (1996) L258. * 2. Riesz, F.: Optika 98. 5th Congres on Modern Optics. SPIE 3573 (1998) 292. 3. Riesz, F.: Phys. Status Solidi A 171 (1999) 403. 4. Laczik, Z.J.: Proc. SPIE 3743 (1999) 151. 5. Riesz, F.: J. Crystal Growth 210 (2000) 370 6. Laczik, Z.J.: Opt. Engn. 39 (2000) 2562. 7. Riesz, F.: Mater. Lett. 46 (2000) 291. 8. Riesz, F.: J. Phys. D 33 (2000) 3033. 9. Riesz, F.: ASDAM 2000 (2000) 215. 10. Lukacs, I.E.: Crystal Research Technol. 36 (2001) 1059. 11. Riesz, F.: Rev. Sci. Instrum. 72 (2001) 1591. 12. Riesz, F.: Defect and Diffusion Forum 221-2 (2003) 51. 13. Riesz, F.: Proc. SPIE 5458 (2004) 86. * 14. Lukács, I. E.: PhD Thesis. Budapest 2006. 15. Riesz, F.: Proc. SPIE 6616 (2007) 66160L. 16. Riesz, F.: Thin Solid Films 516 (2008) 8087. * 17. Mikulik, P.: Habilitation Thesis. Brno 2008. 18. Gitin, A.V.: Applied Optics 48 (2009) 1268. # 19. Riesz, F.: Proc. SPIE 7389 (2009) 73892M. 20. Riesz, F.: Optics Laser Technol. 43 (2011) 245. 21. Riesz, F.: J. Optics 15 (2013) 075709.
* 1. Osamu, O.: Compound Semicond. Bulk Materials and Characterizations. World Sci Publ 2007.
1. Chen, N.F.: Phys. Rev. B 54 (1996) 8516. 2. Chen, N.F.: J. Crystal Growth 173 (1997) 325. 3. Lin, L.Y.: J. Applied Phys. 84 (1998) 5826 4. Lin, L.Y.: Science in China Series E 42 (1999) 456. 5. Chen, N.F.: Defect Diffus. Forum 183 (2000) 85. 6. Chen, N.F.: Materials Sci Engn. B 75 (2000) 134. 7. Olikhovsky, S.J.: Metallofyzik. Nov. Tekh. 22 (2000) 3. 8. Xu, Y.S.: Int. J. Modern Physics B 16 (2002) 4484. # 9. Li, J.: Chinese J. Semicond. 23 (2002) 1187.
1. Wierzchowski, W.: Acta Phys. Polonica A 84 (1993) 789.
1. Dobročka, E.: J. Applied Crystall. 24 (1991) 212. 2. Cusatis, C.: J. Applied Crystall. 48 (2015) 876.
1. Dobročka, E.: J. Applied Crystall. 24 (1991) 212. 2. Spal, R.D.: Phys. Rev. Lett. 86 (2001) 3044. 3. Kohler, R.: Crystal Research Technol. 37 (2002) 734. 4. Schafer, P.: J. Phys D 36 (2003) A113.
1. Franzosi, P.: In: Handbook on Semiconductors 3. Elsevier Sci 1994. P. 1049.
1. Zunde, P.: Inf. Process Manag. 20 (1984) 417.