Ing. Kundrata Ivan

Kürten, S., Hashemizadeh, K., Wu, M., Will, J., Kundrata, I., Spiecker, E., and Bachmann, J.: Direct-patterning SnO2 deposition by atomic-layer additive manufacturing, Mater. Adv. 6 (2025) 3998.

       1. Santucci, S.: J. Vacuum Sci Technol. A 43 (2025) 062411.

Kern S., Yi, G., Büttner, P., Scheler, F., Tran, M.-H., Korenko, S., Dehm, K.E., Kundrata, I., Zahl, A., Albrecht, S., Bachmann, J., and Crisp, R.W.: Monolithic two-terminal tandem solar cells using Sb2S3 and solution-processed pbs quantum dots achieving an open-circuit potential beyond 1.1 V, ACS Applied Mater. Interfaces 16 (2024) 13903-13913. (Not IEE SAS)

1. Meng, L.: Chem. Comm. 60 (2024) 1072.
2. Hajjiah, A.: Mater. Sci Engn. B 303 (2024) 117302.
3. Chen, S.: J. Mater. Chem. A 12  (2024) 18148.
4. Chihi, A.: Applied Phys. A 130 (2024) 532.
5. Hu, J.: ACS Applied Mater. Interfaces 16 (2024) 60842.
6. Zheng, H.R.: ACS Applied Mater. Interfaces 17 (2025) 28128.
7. Mo, Y.: Adv. Mater. 37 (2025) Iss. 40.
8. Ke, A.: Adv. Energy Mater. 15 (2025) Iss. 39.
9. Atofarati, E.O.: J. Coat. Technol. Res. 23 (2026) 229.
10. Feng, L.: Small 22 (2026) Iss. 10.
11. Lu, S.: Chem. Rev. 126 (2026) 2846.

Stefanovic, S., Gheshlaghi, N., Zanders, D., Kundrata, I., Zhao, B., Barr, M.K.S., Halik, M., Devi, A., and Bachmann J.: Direct-patterning ZnO deposition by atomic-layer additive manufacturing using a safe and economical precursor, Small 19 (2023) 2301774. (Not IEE SAS)

        1. Gultom, N.S.: Surfaces Interfaces 54 (2024) 105096.
        2. Zhang, L.: Diamond Relat. Mater. 148 (2024) 111490.
        3. Hossain, A.J.: Phys.-Mater. 7 (2024) 035006.
        4. Martinez-Tomas, M.C.: Acta Crystall. B 80 (2024) 72.
        5. Wu, Y.J.: Small 20 (2024) Iss. 2.
        6. Philip, A.: Adv. Engn. Mater. 26 (2024) Iss. 4.
        7. Cho, T.H.: Small Methods 8 (2024) Iss. 5.
        8. Gultom, N.S.: Surfaces Interfaces 54 (2024) 105096.
        9. Zhang, Q.S.: Ceram. Inter. 51 (2025) 14909. 
     10. Kim, M.: J. Manufact. Process. 153 (2025) 860.
     11. Santucci, S.: J. Vacuum Sci Technol. A 43 (2025) 062411
     12. Lee, C.-H.: Nano-Micro Lett. 18 (2026) 180.

Kundrata, I., Barr, M.K.S., Tymek, S., Döhler, D., Hudec, B., Brüner, P., Vanko, G., Precner, M., Yokosawa, T., Spiecker, E., Plakhotnyuk, M., Fröhlich, K., and Bachmann, J.: Additive manufacturing in atomic layer processing mode, Small Methods (2022) 2101546.

1. Chen, M.: DALTON Trans. 52 (2023) 10254.
2. Chen, Y.X.: NPJ 2D Mater. Appl. 8 (2024) 17.
3. Doi, X.: Small Sci 4 (2024) Iss. 2.
4. Cho, T.H.: Small Methods 8 (2024) Iss. 5.
5. Deng, W.: Nano Energy 128 (2024) 109861.
6. Duan, Y.Q.: Inter. J. Extreme Manufact. 6 (2024) 063001.
7. Rodriguez, D.J.: Rev. Sci Instrum. 95 (2024) 113904.     
8. Saleh, R.: Fuel 395 (2025) 135172.     
9. Han, G.-H.: Small Methods 9 (2025) Iss. 11.

Koch, V.M., Charvot, J., Cao, Y., Hartmann, C., Wilks, R.G., Kundrata, I., Mínguez-Bacho, I., Gheshlaghi, N., Hoga, F., Stubhan, T., Alex, W., Pokorný, D., Topraksal, E., Smith, A.-S., Brabec, C.J., Bär, M., Guldi, D.M., Barr, M.K.S., Bureš, F., and Bachmann, J.: Sb2Se3 thin-film growth by solution atomic layer deposition, Chem. Mater. 34 (2022) 9392–9401. (Not IEE SAS)

        1. Daehne, L.: TM-Techn. Messen 90 (2023) 786.
        2. Wojnar, P.: Nanoscale 16 (2024) 19477.
        3. Willkommen, J.: Crystal Growth Design 24 (2024) 8056.
        4. Zaera, F.: Nanotechnol. 35 (2024) 362001
        5. Sharma, R.: J. Opt. Microsyst. 4 (2024) 031203
        6. Ghosh, S.: Surfaces Interfaces 44 (2024) 103693.
        7. Huang, Y.S.: Annual Rev. Mater. Res. 55 (2025) 255. 
       8. Götz, K.: Adv. Mater. Interfaces 11 (2024) Iss. 26.
        9. Zhu, Q.Q.: Small 21 (2025) Iss. 4.
      10. Sharma, K.: Vacuum 245 (2026) 114968.

Kundrata, I., Mošková, A., Moško, M., Mičušík, M., Dobročka, E., and Fröhlich, K.: Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory, J. Vacuum Sci Technol. A 39 (2021) 062407.

1. Weber, M.: ACS Mater. AU 3 (2023) 274.
2. Jeon, Y.J.: J. Electrochem. Sci Technol. 15 (2024) 365.

Barr, M.K.S., Kundrata, I., Plakhotnyuk, M., Tymek, S., Bruener, P., and Bachmann, J.: ECS M Abstr. MA2021-02 (2021), p. 868.

       1. Chen, M.: Dalton Trans. 52 (2023) 10254.

Barr, M.K.S., Wiesner, P., Kundrata, I., Tymek, S., Plakhotnyuk, M., and Bachmann, J.: ECS M Abstr. MA2021-02 (2021), p. 870.

       1. Chen, M.: Dalton Trans. 52 (2023) 10254.

Chymo, F., Fröhlich, K., Kundrata, I., Hušeková, K., Harmatha, L., Racko, J., Breza, J., and Mikolášek, M.: Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting, AIP Conf. Proc. 2131 (2019) 020020.

1. Pastukhova, N.: Adv. Mater. Interfac. 8 (2021) 2002100.
2. Lee, S.: ACS Applied Energy Mater. 7 (2024) 3253.

Kundrata, I., Fröhlich, K., Vančo, L., Mičušík, M., and Bachmann, J.: Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films, Beilstein J. Nanotechnol. 10 (2019) 1443-1451.

1. Yuan, G.: Chem. Phys. Lett. 773 (2021) 138602.
2. Cao, Y.Y.: Dalton Trans. 50 (2021) 13066.       
3. Kropp, N.: Applied Res. 4 (2025) e70057.

Fröhlich, K., Kundrata, I., Blaho, M., Precner, M.,Ťapajna, M.,Klimo, M., Šuch, O., and Škvarek, O.: Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions, J. Applied Phys. 124 (2018) 152109.

1. Aguirre, F.L.: IEEE Access 8 (2020)‏ 202174.
2. Aguirre, F.L.: J. Low Power Electron. Appl. 11 (2021) 9.
3. Aguirre, F.L.: Front. in Phys. 9 ( 2021) 735021.
4. Aguirre, F.L.: Micromach. 13 (2022) 2002.
5. Ge, P.Z.: Mater. Today Comm. 35 (2023) 105593.
6. Li, C.Y.: J. Alloys Comp. 961 (2023) 170987.       
7. Rudrapal, K.: APL Mater. 14 (2026) 040901.

Fröhlich, K., Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O., and Škvarek, O.: Performance of HfOx– and TaOx-based resistive switching structures in circuits for min and max functions implementation, MRS Adv. 3 (2018) Iss. 59, 3427-3432.

       1. Garcia, H.: Microelectron. Engn. 216 (2019) 111083.
       2. Dudas, A.: Visual Computer 40 (2024) 6969.

Kukli, K., Kemeli, M., Vehkamäki, M., Heikkilä, M.J., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M., Kundrata, I., and  Fröhlich, K.: Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films, AIP Adv. 7 (2017) 025001.

       1. Lehninger, D.: Applied Phys. Lett. 110 (2017) 262903.
       2. Jiang, H.: ACS Applied Mater. Interf. 9 (2017) 16296.
       3. Alkhayatt, A.H.O.: Optik 159 (2018) 305.
       4. Jiang, S.: AIP Adv. 8 (2018) 085109.
       5. Li, J.: Nanoscale Res. Lett. 14 (2019) 75.
       6. Mackus, A.J.M.: Chem. Mater. 31 (2019) 1142.
       7. Qin, G.: RSC Adv. 9 (2019) 35289.
       8. Baek, G.: Microelectron. Engn. 215 (2019) 110987.
       9. Anderson, E.C.: ACS Applied Electron. Mater. 1 (2019) 692.
      10. Bhanu, J.U.: Mater. Sci Semicond. Process. 119 (2020) 105171.
      11. Vitale, S.A.: ACS Applied Mater. Interfac. 12 (2020) 43250.
12. Muneshwar, T.: J. Vacuum Sci Technol. A 39 (2021)030401.
13. Cai, C.: Applied Surface Sci 560 (2021) 149960.
14. Sosnov, E.A.: Russian J. Applied Chem. 94 (2021) 1189.
15. Fedorov, P.: Coatings 11 (2021) 1206.
16. Pham, P.V.: Chem. Rev. 122 (2022) 6514.
17. Gurylev, V.: Mater. Today Sustainab. 18 (2022) 100131.
#    18. Malode, S.J.: In Metal Oxides Biomed.Biosensor Appl., 2021-pp. 471.
#     19. Keeney, L.: In Tailored Functional Oxide Nanomater.: From Design to Multi-Purpose Appl. Elsevier 2022. ISBN 978-352782694-0.
20. Islam, M.S.: Sci Rep. 13 (2023) 16656.
21. Han, C.C.: Fuels Energy 37 (2023) 13624.
#     22. Al Amin, S.M.: e-Proc5th IEEE Inter. Conf. Telecomm. Photonics, ICTP 2023.
#     23. Singh, E.R.: Springer Proc. in Mater. 25. Springer 2023, pp. 97. ISBN978-981-99-3843-8
       24. Flynn-Hepford, M.: Nanomater. 15 (2025) 732.
       25. Witsell, S.M.W.: J. Vacuum Sci Technol. A 43 (2025) 042402.  
     26. Tran, V.H.A.: J. Alloys Comp. 1041 (2025) 183864.