Hutár, P., Sojková, M.,
Kundrata, I., Vegso, K., Shaji, A., Nádaždy, P., Pribusová Slušná, L., Majková, E., Siffalovic, P., and Hulman, M.:
Correlation between the crystalline phase of molybdenum oxide and horizontal alignment in thin MoS2 films, J. Phys. Chem. C 124 (2020) 19362–19367.
Kundrata, I., Fröhlich, K., Vančo, L., Mičušík, M., and Bachmann, J.:
Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films, Beilstein J. Nanotechnol. 10 (2019) 1443-1451.
Chymo, F., Fröhlich, K.,
Kundrata, I., Hušeková, K., Harmatha, L., Racko, J., Breza, J., and Mikolášek, M.:
Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting, AIP Conf. Proc. 2131 (2019) 020020.
Fröhlich, K.,
Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O., and Škvarek, O.:
Performance of HfOx– and TaOx-based resistive switching structures in circuits for min and max functions implementation, MRS Adv. 3 (2018) Iss. 59, 3427-3432.
Fröhlich, K.,
Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O., and Škvarek, O.:
Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions, J. Applied Phys. 124 (2018) 152109.
Kukli, K., Kemeli, M., Vehkamäki, M., Heikkilä, M., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M.,
Kundrata, I., Fröhlich, K., :
Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films,. AIP Adv. 7 (2017) 025001. (APVV 14-0560). (VEGA 2/0138/14).
Kundrata, I., Fröhlich, K., Ballo, P., : Lithium ion intercalation into thin film anatase In: Proc. 21th Inter. Conf. on Applied Phys. of Cond. Matter (APCOM 2015). Eds. J. Vajda and I. Jamnický. Bratislava: FEI STU 2015. ISBN 978-80-227-4373-0. P. 184-188.
