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Fröhlich, K., Kundrata, I., Blaho, M., Precner, M., Ťapajna, M., Klimo, M., Šuch, O., and Škvarek, O.: Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions, J. Applied Phys. 124 (2018) 152109.

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Kukli, K., Kemeli, M., Vehkamäki, M., Heikkilä, M., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M., Kundrata, I., and Fröhlich, K.: Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films, AIP Adv. 7 (2017) 025001.

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