The laboratory provides complex analysis of physical properties of the surface by means of scanning electron microscopy and scanning probe microscopy. The laboratory allows scientists to image, characterize and even modify material structures in the range of few millimeters down to sub 100-nm scale. The surface modification of samples can be performed by local anodic oxidation or by electron beam lithography.
Equipments:
- NTEGRA Prima, scanning probe microscope (SPM) equipped with complementary probe techniques, including MFM, EFM, KPM and LAO lithography.
- Inspect F50, scanning electron microscope equipped with Elphy Quantum lithography control software (Raith) and laser interferometric measuring system for precise stage positioning.
- FEG250, scanning electron microscope with a resolution of 1.2 nm equipped with SE and BSE detector with a possibility to measure in environmental mode (for non-conductive samples). It also offers energy dispersive X-ray spectroscopy (EDS) using XFlash 6.
- FlexSEM 1000 II – scanning electron microscope with thermionic cathode equipped with a secondary (SE) and backscattered electron (BSE) detector. The resolution of the microscope is 4 nm (SE-20 kV). The microscope also includes a UVD detector for measuring cathodoluminescence in low-vacuum conditions, which can be used to measure some types of crystalline nanoparticles and specific defects in semiconductors. In addition, the microscope is equipped with a STEM holder for measuring nanoparticles by detecting transmission electrons from a thin-film specimen placed on a TEM grid.
Application:
- topography imaging of conductive and non-conductive samples
- analysis of surface roughness
- specialized magnetic measurements with an external magnetic field up to 200 mT
- local anodic oxidation lithography
- electron-beam lithography
Contact: Ing. J. Šoltýs, PhD., Tel.: +421-2-5922 2652
Access: Guided access or individual access after introductory training (4 – 8 hours)
Price: 0 Eur/hour for SAS employees
