The laboratory provides thin film deposition of metals, insulators and magnetic materials. The system AJA Orion 8E includes magnetron sputtering, e-beam and thermal evaporation. It enables also sample treatment by RF cleaning, ion milling and heating in situ.
- Hybrid evaporation and sputtering system AJA Orion 8E
- Dry vacuum system with base pressure 1×10-8 Torr (cryo pump, load lock system)
- Evaporation – two independent multipocket e- beam sources, two thermal sources
- Sputtering – two A320-XP 2” UHV magnetrons for DC or RF sputtering in Ar gas
- Substrate – 3” diameter, radiant heating (850°C), RF/DC bias, ion beam milling gun, azimuthal rotation and 2” z-motion
Application:
- E-beam evaporation material for microelectronic structures
- Co-deposition two materials simultaneously
- Preparation ohmic and schottky contacts
- RF and DC sputtering of metallic, insulating, and magnetic materials (co-sputtering, superlattice)
- Deposition of materials in different gas environment: N2 (TiN), O2 (Al2O3)
Leybold UNIVEX 400 E-beam system:
- Compact vacuum system with electron beam evaporation
- Vacuum up to pressures of 5×10-7 Torr (without load-lock system)
- Evaporation – 8 eight different conical pockets for metal materials
- Substrate – max 350 mm
- Steaming process – manual, semi-automated, or fully automated
- Composition: – process module (vacuum chamber with cryogenic pumping system), – control module (power supply, integrated PC/PLC and process controller)
Application:
- Preparation of gate and ohmic contacts, or metal masks for microelectronics
- Materials – Ti, Al, Ni, Au or Pt
Contact: Ing. J. Fedor, PhD., Tel.: +421-2-5922 2358, Ing. R. Stoklas, PhD., Ing. T. Ščepka, PhD.
Access: guided access, booking via e-mail or phone
Price: 0 Eur/hour for SAS employees