Article list

610
Si-Doped GaN Cap Layer Enhances Stability and Prevents Current Collapse in HEMTs

Highly Si-doped gallium nitride (n++ GaN) layers play a key role in developing reliable high-electron-mobility transistors (HEMTs) for power and communication electronics. Our researchers from the group of III-V semiconductors investigated their growth using metal-organic chemical vapor deposition (MOCVD) at 800 °C and optimized the silicon precursor flow (SiH₄) to improve both electrical and structural…

»
512
Vacant post-doc position: Growth and preparation of III-N quantum structures for fast electronic

Applicant will deal with the growth and processing of epitaxial III-N quantum structures prepared by metal-organic chemical-vapor deposition. Main emphasize will be given to heterostructure quantum wells containing In(Al)N compounds for future ultra-fast transistors, mixed-signal electronics as well as GaN-based vertical switches. Material study will include several techniques for structural, electrical and optical investigations. Finally,…

»