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Investigation of exposure parameters of e-beam resists for photomasks fabrication. In: PRONANO: proc. Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis and Synthesis. Eds. Th. Sulzbach, I.W. Rangelow. - Münster : MV Wissenschaft, 2010, p. 99-110. ISBN 978-3-86991-177-9.
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Material optimization of the alignment marks for the EBDW lithography. In: ASDAM '10. Smolenice 2010. Ed. J. Breza et al. Piscataway: IEEE 2010. ISBN: 978-1-4244-8572-7. P. 85-88.
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